| Autor: |
Otto, Michael, Leibold, Andreas, Wulf, Lars, Hurlebaus, Matthias, Pfitzner, Lothar |
| Zdroj: |
Diffusion and Defect Data Part B: Solid State Phenomena; January 2009, Vol. 145 Issue: 1 p135-138, 4p |
| Abstrakt: |
As a result of shrinking dimensions and technology nodes, nanoelectronics manufacturing and handling processes demand growing requirements to the cleanliness of the air inside cleanrooms and microenvironments. Besides the limitation of particle contamination, the limitation of airborne molecular contamination (AMC) is necessary to ensure yield and quality of nanoelectronics production lines. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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