Improvement of Contact Clean Using Single-Wafer Clean Process for 90nm and Beyond
Autor: | Nam, Jae Woo, Zagrebelny, Andrey, Blumenthal, Roc, Block, Joy, Duray, Miranda, Aegerter, Brian |
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Zdroj: | Diffusion and Defect Data Part B: Solid State Phenomena; November 2007, Vol. 134 Issue: 1 p313-316, 4p |
Abstrakt: | Not Available |
Databáze: | Supplemental Index |
Externí odkaz: |