Effect of an Organic Inhibitor in High pH Chemical Rinse on the Platen for Cu-CMP

Autor: Petitdidier, Sébastien, Bartosh, Kyle, Trouiller, Chantal, Couvrat, Alexandre, Liu, Jun, Zaleski, Mark
Zdroj: Diffusion and Defect Data Part B: Solid State Phenomena; November 2007, Vol. 134 Issue: 1 p299-302, 4p
Abstrakt: Not Available
Databáze: Supplemental Index