Effect of an Organic Inhibitor in High pH Chemical Rinse on the Platen for Cu-CMP
Autor: | Petitdidier, Sébastien, Bartosh, Kyle, Trouiller, Chantal, Couvrat, Alexandre, Liu, Jun, Zaleski, Mark |
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Zdroj: | Diffusion and Defect Data Part B: Solid State Phenomena; November 2007, Vol. 134 Issue: 1 p299-302, 4p |
Abstrakt: | Not Available |
Databáze: | Supplemental Index |
Externí odkaz: |