Minimization of Electric Field Enhancement at Electrode Edge by Surface High Resistive Layer in Ti/4H-SiC Schottky Barrier Diode

Autor: Ohtsuka, Ken Ichi, Sugimoto, Hiroshi, Kinouchi, Shin Ichi, Tarui, Yoichiro, Imaizumi, Masayuki, Takami, Tetsuya, Ozeki, Tatsuo
Zdroj: Materials Science Forum; April 2002, Vol. 389 Issue: 1 p1165-1168, 4p
Abstrakt: Not Available
Databáze: Supplemental Index