Thermal Annealing Effect on TiN/Ti Layers on 4H-SiC: Metal-Semiconductor Interface Characterization
| Autor: | Defives, D., Durand, O., Wyczisk, F., Olivier, J., Noblanc, Olivier, Brylinski, C. |
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| Zdroj: | Materials Science Forum; May 2000, Vol. 338 Issue: 1 p411-414, 4p |
| Abstrakt: | Not Available |
| Databáze: | Supplemental Index |
| Externí odkaz: |
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