Anisotropic ECR Plasma Etching with Low-Energy Ions
| Autor: | Tobinaga, Y., Miyano, T., Fujimoto, K., Fujito, M., Fujiwara, H. |
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| Zdroj: | Materials Science Forum; October 1993, Vol. 140 Issue: 1 p39-54, 16p |
| Abstrakt: | Not Available |
| Databáze: | Supplemental Index |
| Externí odkaz: |
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