| Autor: |
DeVries, R. C., Reihl, R. F., Tuft, R. E. |
| Zdroj: |
Journal of Materials Science; February 1989, Vol. 24 Issue: 2 p505-509, 5p |
| Abstrakt: |
It is possible to ion implant patterns in diamond crystals at fluences below that which would impart visible damage and then to reveal those patterns by electrostatic charging and dusting. The charge distribution — and therefore the dust attachement — is related to the difference in electrical conductivity between the implanted region and the rest of the crystal. The technique may have applicability for “fingerprinting” or personalizing diamond gemstones. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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