Breakdown of thin films “cured” with tantalum oxide

Autor:	Brekhunov, V. I., Motoshkin, V. V., Mukhachev, V. A.
Zdroj:	Russian Physics Journal; April 1977, Vol. 20 Issue: 4 p523-526, 4p
Abstrakt:	Studies have been made of the temperature and time characteristics of breakdown in a thin Ta2O5 film produced by reactive evaporation with subsequent “curing” of the defect sites, with aluminum electrodes. The data obtained are explained from the viewpoint of classical thermal breakdown.
Databáze:	Supplemental Index
Externí odkaz:	Zobrazit plný text záznamu Full text from SpringerLink