| Autor: |
Abaffy, N. Biluš, Partridge, J. G., Plessis, J. du, McCulloch, D. G. |
| Zdroj: |
Physica Status Solidi (A) - Applications and Materials Science; June 2008, Vol. 205 Issue: 6 p1439-1442, 4p |
| Abstrakt: |
A Filtered Cathodic Vacuum Arc (FCVA) deposition system has been used to produce Al2O3/Al/Al2O3trilayers for use as optically absorbing coatings. Ellipsometry was used to measure the optical constants of the AlOxfilms and X-ray photoelectron spectroscopy (XPS) was used to measure their stoichiometry. It was found that a wide range of Ar/O2inlet flow-rates could be used to produce stoichiometric Al2O3in the FCVA system. Several Al2O3/Al/Al2O3tri-layers have been produced with different Al layer thicknesses and the simulated and experimental reflection characteristics have been compared. An average reflectance of 4 was achieved over the visible spectrum for the optimised trilayer coating deposited on silicon. (© 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim) |
| Databáze: |
Supplemental Index |
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