PREVAIL - An e-beam stepper with Variable Axis Immersion Lenses
| Autor: | Pfeiffer, H.C., Stickel, W. |
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| Zdroj: | Microelectronic Engineering; February 1995, Vol. 27 Issue: 1-4 p143-146, 4p |
| Abstrakt: | Project PREVAIL (Projection Exposure with Variable Axis Immersion Lenses) has been initiated to develop an e-beam alternative to “sub-optical” lithography (≤0.13 μm) providing superior resolution and pattern placement accuracy at competitive throughput. |
| Databáze: | Supplemental Index |
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