| Autor: |
Lercel, M.J., Redinbo, G.F., Rooks, M., Tiberio, R.C., Craighead, H.G., Sheen, C.W., Allara, D.L. |
| Zdroj: |
Microelectronic Engineering; February 1995, Vol. 27 Issue: 1-4 p43-46, 4p |
| Abstrakt: |
Self-assembled monolayers have been demonstrated to perform as high-resolution electron beam resists with minimum resolutions of <20nm for 50keV electron beams and <15nm for 10eV electrons from a scanning tunneling microscope. The resulting patterns have been transferred into many substrates by both wet and dry etching. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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