| Autor: |
Bukhanov, V. M., Morozov, V. G., Yurasova, V. E. |
| Zdroj: |
Radiation Effects and Defects in Solids; January 1973, Vol. 19 Issue: 4 p215-218, 4p |
| Abstrakt: |
The dependence of the angular distribution of atoms sputtered from the (001) monocrystalline copper face on the incidence angle of 22 keV neon ions has been studied. Use is made of well known ideas defining the observed distribution as a result of superposition of the directed atomic yield along the close-packed axes and of the random yield along all directions. The values obtained for the relative contribution of the directed and random sputterings indicate that the dependence of these values on the ion incidence angle is distinctly anisotropic. The yield of the directed sputtering had a minimum value when the incidence directions of the bombarding ions coincided with the low-index crystallographic axes. In addition, the width of (011) and [001] pattern spots was also found to be an anisotropic function of the ion incidence angle. The spots have the smallest width when the direction of ion incidence coincides with the low-index axes. The observed dependences are discussed on the basis of the focusing mechanism of the sputtered atom yield. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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