Fullerene-assisted electron-beam lithography for pattern improvement and loss reduction in InP membrane waveguide devices.
| Autor: | Yuqing Jiao, Pello, Josselin, Mejia, Alonso Millan, Shen, Longfei, Smalbrugge, Barry, Geluk, Erik Jan, Smit, Meint, van der Tol, Jos |
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| Zdroj: | Optics Letters; 3/15/2014, Vol. 39 Issue 6, p1645-1648, 4p |
| Databáze: | Supplemental Index |
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