| Autor: |
Catmull, K.B., Cosway, R.G., Letherer, B. A., Horner, G. S. |
| Předmět: |
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| Zdroj: |
Semiconductor International; Jun98, Vol. 21 Issue 6, p203, 3p, 3 Black and White Photographs, 9 Graphs |
| Abstrakt: |
Focuses on the corona-oxide-semiconductor (COS) technique which is used when monitoring contamination levels for the production of semiconductor devices. Comparison between capacitance-voltage (C-V) testing and the COS technique; What are the two techniques used to measure the response of a semiconductor after a charge position; Details on these two techniques. INSET: At a glance.... |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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