| Autor: |
Grigonis, A., Rutkūnienė, Z., Kaminskas, V. |
| Předmět: |
|
| Zdroj: |
International Conference: Radiation Interaction with Material & Its Uses in Technologies; 2008, p123-126, 4p, 1 Diagram, 1 Graph |
| Abstrakt: |
Formation of nano structures during a-CH films deposition from acetylene on the Ni coated silicon by plasma enhanced chemical vapor deposition was idea of this work. The film properties were investigated by Raman spectroscopy (RS), null-ellipsometry and micro hardness measurements. Surface morphology was analyzed by scanning electron microscopy (SEM) model JEOL JSM-5600.It was obtained that type and surface morphology of formatted a-CH films depend on current density when ion energies (100-200)eV. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
|
