The electric field and dopant distribution in p-i-n structures observed by ionisation potential (dopant contrast) microscopy in the HRSEM.

Autor: Cullis, A. G., Hutchison, J. L., Grunbaum, E., Barkay, Z., Shapira, Y., Barnham, K., Bushnell, D. B., Ekins-Daukes, N. J., Mazzer, M., Wilshaw, P. R.
Zdroj: Microscopy of Semiconducting Materials; 2005, p503-506, 4p
Abstrakt: The method of ionisation potential (dopant contrast) microscopy in the HRSEM is applied to the study of the electric field distribution in p-i-n structures used as quantum well solar cells. Our results show a secondary electron signal which varies between the different layers, being greatest in the p-type and smallest in the n-type regions respectively. The stacks of 8 nm wide quantum wells and their corresponding barriers are clearly distinguished in the intrinsic region of the devices. In-situ observation of reverse biased structures has been performed to determine the effect of bias on the potential distribution within the devices. [ABSTRACT FROM AUTHOR]
Databáze: Supplemental Index