Photocatalytic Lithography Processing via Poly(vinyl butyral)/TiO2Photoresists by Ultraviolet (UV) Exposure.
| Autor: | Leo Chau-Kuang Liau, Wen-Wei Chou, Rung-Kang Wu |
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| Zdroj: | Industrial & Engineering Chemistry Research; Apr2008, Vol. 47 Issue 7, p2273-2278, 6p |
| Databáze: | Supplemental Index |
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