Atomic Layer Deposition of HfO2Thin Films Exploiting Novel Cyclopentadienyl Precursors at High Temperatures.

Autor: Jaakko Niinistö, Matti Putkonen, Lauri Niinistö, Fuquan Song, Paul Williams, Peter N. Heys, Rajesh Odedra
Zdroj: Chemistry of Materials; Jun2007, Vol. 19 Issue 13, p3319-3324, 6p
Databáze: Supplemental Index