Atomic Layer Deposition of HfO2Thin Films Exploiting Novel Cyclopentadienyl Precursors at High Temperatures.
| Autor: | Jaakko Niinistö, Matti Putkonen, Lauri Niinistö, Fuquan Song, Paul Williams, Peter N. Heys, Rajesh Odedra |
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| Zdroj: | Chemistry of Materials; Jun2007, Vol. 19 Issue 13, p3319-3324, 6p |
| Databáze: | Supplemental Index |
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