Ab Initio Prediction of Vapor Pressure for Diverse Atomic Layer Deposition Precursors.

Autor: Odinokov, Alexey, Son, Won-Joon, Yakubovich, Alexander, Park, Ji Young, Jung, Yongsik
Zdroj: Journal of Chemical Theory & Computation; 7/23/2024, Vol. 20 Issue 14, p6144-6151, 8p
Databáze: Supplemental Index