SYNTHESIS AND PROPERTIES OF FULLERENE CONTAINED FILMS IN RF PLASMA.

Autor: Azharonok, V. V., Filatova, I. I., Shimanovich, V. D.
Předmět:
Zdroj: High Temperature Material Process: An International Journal; 2005, Vol. 9 Issue 2, p263-267, 5p, 1 Diagram, 2 Graphs
Abstrakt: The process of deposition of semitransparent fullerene contained composite films in a capacitively coupled rf discharge is investigated. The 5.28 MHz discharge is operated in a parallel plate reactor. As a working gas helium is used at pressure 0.5 ÷ 5 Torr. Carbon films are deposited on a quartz plate. Products of electric arc synthesis of fullerenes (a small-dispersed carbon soot containing fullerene C 60 and C70) are used as an initial substance for making carbon films. The processes in the discharge are studied by emission spectroscopy methods. The gas kinetic temperature is measured in different zones of the discharge gap near the quartz substrate. Optical absorption properties and structure of obtained films are investigated using UV-VIS spectrophotometer and scanning electron microscope. [ABSTRACT FROM AUTHOR]
Databáze: Supplemental Index