Thermal Atomic Layer Etching of MoS2 Using MoF6 and H2O.
| Autor: | Soares, Jake, Mane, Anil U., Choudhury, Devika, Letourneau, Steven, Hues, Steven M., Elam, Jeffrey W., Graugnard, Elton |
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| Zdroj: | Chemistry of Materials; 2/14/2023, Vol. 35 Issue 3, p927-936, 10p |
| Databáze: | Supplemental Index |
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