Novel Approach to High κ (∼59) and Low EOT (∼3.8 Å) near the Morphotrophic Phase Boundary with AFE/FE (ZrO2/HZO) Bilayer Heterostructures and High-Pressure Annealing.
| Autor: | Gaddam, Venkateswarlu, Kim, Giuk, Kim, Taeho, Jung, Minhyun, Kim, Chaeheon, Jeon, Sanghun |
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| Zdroj: | ACS Applied Materials & Interfaces; 9/28/2022, Vol. 14 Issue 38, p43463-43473, 11p |
| Databáze: | Supplemental Index |
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