Elucidating the Reaction Mechanism of Atomic Layer Deposition of Al2O3 with a Series of Al(CH3)xCl3–x and Al(CyH2y+1)3 Precursors.
| Autor: | Oh, Il-Kwon, Sandoval, Tania E., Liu, Tzu-Ling, Richey, Nathaniel E., Nguyen, Chi Thang, Gu, Bonwook, Lee, Han-Bo-Ram, Tonner-Zech, Ralf, Bent, Stacey F. |
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| Zdroj: | Journal of the American Chemical Society; 7/6/2022, Vol. 144 Issue 26, p11757-11766, 10p |
| Databáze: | Supplemental Index |
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