Controlled Electrochemical Formation of GexSbyTez using Atomic Layer Deposition (ALD).

Autor: Liang, Xuehai, Jayaraju, Nagarajan, Thambidurai, Chandru, Zhang, Qinghui, Stickney, John L.
Zdroj: Chemistry of Materials; Apr2011, Vol. 23 Issue 7, p1742-1752, 11p
Databáze: Supplemental Index