Stress-Induced Crystallization of Thin Hf1–XZrXO2 Films: The Origin of Enhanced Energy Density with Minimized Energy Loss for Lead-Free Electrostatic Energy Storage Applications.

Autor: Kim, Si Joon, Mohan, Jaidah, Lee, Joy S., Kim, Harrison Sejoon, Lee, Jaebeom, Young, Chadwin D., Colombo, Luigi, Summerfelt, Scott R., San, Tamer, Kim, Jiyoung
Zdroj: ACS Applied Materials & Interfaces; 2/6/2019, Vol. 11 Issue 5, p5208-5214, 7p
Databáze: Supplemental Index