| Autor: |
Lymberopoulos, Dimitris, Iliopoulos, Ilias, Kyoung-Shik Jun, Li, Howard, Armacost, Michael |
| Předmět: |
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| Zdroj: |
Semiconductor International; Jul2004, Vol. 27 Issue 8, p69-74, 4p, 1 Diagram, 3 Graphs |
| Abstrakt: |
Presents information on the use of advanced process control in semiconductor wafer processing. Forms that APC manifests itself during wafer processing; Factors to be considered when implementing an APC in a wafer-to-wafer process cycle; Description of the procedure in which APC is used to correct the left-to-right tool/chamber mismatch of dielectric systems. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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