Effect of Hydrogen on the Properties of RF-Magnetron Sputtering ZnO:Al Films as an Alternative to Commercially Available TCO Films.
| Autor: | Das, Rajesh, Sekhar Das, Himadri |
|---|---|
| Zdroj: | Journal of the Institution of Engineers (India): Series D; Oct2017, Vol. 98 Issue 2, p203-210, 8p |
| Databáze: | Supplemental Index |
| Externí odkaz: |
|
Full text from SpringerLink