Record Surface State Mobility and Quantum Hall Effect in Topological Insulator Thin Films via Interface Engineering.

Autor: Koirala, Nikesh, Brahlek, Matthew, Salehi, Maryam, Liang Wu, Jixia Dai, Justin Waugh, Nummy, Thomas, Han, Myung-Geun, Jisoo Moon, Yimei Zhu, Dessau, Daniel, Weida Wu, Armitage, N. Peter, Seongshik Oh
Zdroj: Nano Letters; Dec2015, Vol. 15 Issue 12, p8245-8249, 5p
Databáze: Supplemental Index