NMOS source-drain extension ion implantation into heated substrates.
Autor: | Pipes, Leonard C., McGill, Lisa, Jahagirdar, Anant |
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Zdroj: | 2014 20th International Conference on Ion Implantation Technology (IIT); 2014, p1-6, 6p |
Databáze: | Complementary Index |
Externí odkaz: |