Comparison of microstructure and surface passivation quality of intrinsic a-Si:H films deposited by remote plasma chemical vapor deposition using argon and helium plasma.
| Autor: | Onyegam, E. U., Wiedmar, K. F., Saha, S., James, William, Banerjee, S.K. |
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| Zdroj: | 2014 IEEE 40th Photovoltaic Specialist Conference (PVSC); 2014, p1230-1233, 4p |
| Databáze: | Complementary Index |
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