Analysis of grain-boundary structure in Al-Cu interconnects.

Autor: Field, David P., Sanchez Jr., John E., Besser, Paul R., Dingley, David J.
Předmět:
Zdroj: Journal of Applied Physics; 9/1/1997, Vol. 82 Issue 5, p2383, 10p, 10 Black and White Photographs, 3 Graphs
Abstrakt: Focuses on the characterization of texture and grain-boundary structure of Al-Cu interconnect lines using orientation imaging microscopy, and upon the linewidth dependence of the measures. Postpatterning anneal on boundary structure as a function of linewidth; Conventionally fabricated specimens; Crystallographic texture.
Databáze: Complementary Index