Use of optical metrology techniques for uniformity Control of 3D stacked IC's.
| Autor: | Le Cunff, D., Tardif, M., Hotellier, N., Le Chao, K., Chapelon, L.L., Bar, P., Eynard, S., Piel, J.P., Fresquet, G. |
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| Zdroj: | 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014); 2014, p62-66, 5p |
| Databáze: | Complementary Index |
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