Etch planarization - A new approach to correct non-uniformity post chemical mechanical polishing.
| Autor: | Meihua Shen, Zhou, Baosuo, Yifeng Zhou, Hoang, John, Bowers, Jim, Bailey, Andrew, Pape, Eric, Singh, Harmeet, Dasaka, Ravi K., Wise, Rich |
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| Zdroj: | 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014); 2014, p423-427, 5p |
| Databáze: | Complementary Index |
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