Grain boundary amorphization reaction in thin films of elemental Cu and Y.

Autor: Johnson, R. W., Ahn, C. C., Ratner, E. R.
Předmět:
Zdroj: Applied Physics Letters; 2/27/1989, Vol. 54 Issue 9, p795, 3p
Abstrakt: Compositionally modulated thin films of Cu and Y were prepared in an ultrahigh vacuum dc ion beam deposition chamber. Room-temperature growth of an amorphous Cu-Y phase was observed with interdiffusion of the elemental Cu and Y. Transmission electron microscopy of as-prepared samples revealed a novel growth morphology; amorphous phase formation was observed both at the original Cu/Y interface and between the grains of the elemental Y. Estimates for the thermodynamic and kinetic factors underlying the grain boundary amorphization reaction are presented. [ABSTRACT FROM AUTHOR]
Databáze: Complementary Index