Atomic Layer Deposition of SiN for spacer applications in high-end logic devices.
| Autor: | Koehler, F., Triyoso, D. H., Hussain, I., Mutas, S., Bernhardt, H. |
|---|---|
| Zdroj: | IOP Conference Series: Materials Science & Engineering; 2012, Vol. 41 Issue 1, p1-1, 1p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|