Enhanced etching of sapphire damaged by ion implantation.
Autor: | Dongzhu, Xie, Dezhang, Zhu, Haochang, Pan, Hongjie, Xu, Zongxin, Ren |
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Zdroj: | Journal of Physics D: Applied Physics; 7/21/1998, Vol. 31 Issue 14, p1-1, 1p |
Databáze: | Complementary Index |
Externí odkaz: |