Enhanced etching of sapphire damaged by ion implantation.

Autor: Dongzhu, Xie, Dezhang, Zhu, Haochang, Pan, Hongjie, Xu, Zongxin, Ren
Zdroj: Journal of Physics D: Applied Physics; 7/21/1998, Vol. 31 Issue 14, p1-1, 1p
Databáze: Complementary Index