Sheath properties of RF plasmas in a parallel plate etch reactor; the high-frequency regime (ω>ωi).
| Autor: | Vallinga, P. M., Meijer, P. M., Hoog, F. J. de |
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| Zdroj: | Journal of Physics D: Applied Physics; 11/14/1989, Vol. 22 Issue 11, p1-1, 1p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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