Planar reactor plasma etching with barrel reactor power supply.
| Autor: | Setzer, C. S., Mattauch, R. J. |
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| Zdroj: | Review of Scientific Instruments; May85, Vol. 56 Issue 5, p761, 3p |
| Abstrakt: | A very simple and inexpensive method of converting a barrel plasma etching system into a planar system is described. Details of structure and operating characteristics of the planar reaction chamber are shown. [ABSTRACT FROM AUTHOR] |
| Databáze: | Complementary Index |
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