| Autor: |
Nishino, J., Morigami, M., Harada, M., Terakado, S., Kobayashi, S., Fujiwara, S., Kaneda, K., Goto, T., Shimizu, R., Suzuki, S., Maezawa, H., Ando, M. |
| Předmět: |
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| Zdroj: |
Review of Scientific Instruments; Jul1989, Vol. 60 Issue 7, p2153, 4p |
| Abstrakt: |
A new method for pattern reduction in the x-ray region is proposed. In its principle was used the asymmetric Bragg reflection giving the different beamwidth in the reflected beam from the incident one. Light from an undulator line (BL-2) at the Photon Factory was used to obtain highly spatially resolved replication in reasonably short exposure time. Performed was onedimensional demagnification of a pattern with a ratio of 1/4 in the following condition: Si 111 reflection was used where the offset angle α from the surface is 22° and the wavelength λ was 3.5 λ, which is available from the 7th harmonic of the undulator radiation. The submicron scale resist pattern was resolved. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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