| Autor: |
Polman, A. |
| Předmět: |
|
| Zdroj: |
Journal of Applied Physics; 7/1/1997, Vol. 82 Issue 1, p1, 39p, 1 Black and White Photograph, 6 Diagrams, 5 Charts, 60 Graphs |
| Abstrakt: |
Describes the synthesis, characterization, and application of several different Er-doped thin film photonic materials. Focus on oxide glasses, ceramic thin films, and amorphous and crystalline silicon; MeV ion implantation as a technique suited for doping of the materials; Role of implantation defects, effect of annealing, concentration dependent effects, and optical activation. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
|
