| Autor: |
Matsuoka, M., Nishide, M., Tai, T., Kim, J. W., Shima, H., Katoda, T., Funakubo, H., Nishida, K., Yamamoto, T. |
| Předmět: |
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| Zdroj: |
Integrated Ferroelectrics; 2014, Vol. 157 Issue 1, p39-46, 8p |
| Abstrakt: |
The influence of the post-deposition cooling speed on the domain formation process of PbTiO3films was investigated using MOCVD equipment combined within-situRaman spectroscopy. The accumulation and relaxation of strain during the post-deposition cooling process is responsible for the domain structure. The Curie temperature for fast cooling is lower than that for slow cooling. Additionally, the residual strain with fast cooling is smaller than that with slow cooling. These observations suggest that the volume fraction of thec-domain is larger for fast cooling and that the atmospheric conditions during the first post-deposition cooling process may control the domain structure. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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