| Autor: |
Gorbov, I. V., Kryuchyn, A. A., Grytsenko, K. P., Manko, D. Yu., Borodin, Yu. O. |
| Předmět: |
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| Zdroj: |
Semiconductor Physics, Quantum Electronics & Optoelectronics; 2014, Vol. 17 Issue 1, p52-55, 4p |
| Abstrakt: |
Pits 250-300 - nm wide were obtained on the surface of thin organic nanocomposite film using master-disc laser-burning station with 405 nm laser beam focused by 0.85 NA lens. The film with obtained pits was used as a mask for subsequent reactive ion-beam etching of glass substrate. Finally, 150-200-nm pits were performed on the substrate surface. Nanocomposite films were based on organic positive photoresist with a dye inclusions. This dye is characterized by wide absorption band within the spectral region 390-410 nm and can be evaporated by laser irradiation with the wavelength 405 nm. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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