Talbot Lithography as an Alternative for Contact Lithography for Submicron Features.

Autor: Dunbar, L. A., Nguyen, D., Timotijevic, B., Vogler, U., Veseli, S., Bergonzi, G., Angeloni, S., Bramati, A., Voelkel, R., Stanley, R. P.
Zdroj: Proceedings of SPIE; Nov2014, p1-8, 8p
Databáze: Complementary Index