Effect of post-deposition annealing on structural and optical properties of RF magnetron sputtered β-Ga2O3 films.

Autor: Aida, R., Minami, K., Ishibashi, K., Kudou, J., Takahara, M., Tsunoda, I., Takakura, K., Nakashima, T., Shibuya, M., Murakami, K.
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Zdroj: AIP Conference Proceedings; 2014, Vol. 1583, p364-367, 4p, 1 Diagram, 5 Graphs
Abstrakt: Gallium oxide (Ga2O3) films are prepared by RF magnetron sputtering at room temperature. Structural and optical properties of the films with different thickness are studied before and after annealing. An increase in surface roughness due to grain size growing is observed on annealed films. However, optical transmittance in infrared to ultra violet region was kept at above 80% regardless of the rough surface morphology. [ABSTRACT FROM AUTHOR]
Databáze: Complementary Index