| Autor: |
Pimenta de Araújo, Cíntia Tereza, Prieto, Lúcia Trazzi, Lima, Adriano Fonseca, Souza-Junior, Eduardo José, Dias, Carlos Tadeu Santos, Paulillo, Luís Alexandre Maffei Sartini |
| Předmět: |
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| Zdroj: |
Acta Odontologica Scandinavica; Feb2014, Vol. 72 Issue 2, p113-119, 7p |
| Abstrakt: |
Objectives. To assess the influence of light-curing unit tip distance on the microtensile bond strength (μTBS) and nanoleakage of self-etching adhesives to enamel and dentin. Materials and methods. Flat buccal surfaces were prepared on 198 bovine incisors. The teeth were randomly assigned into nine groups for μTBS ( n = 8) and nanoleakage ( n = 3) testing according to the adhesive system (Clearfil Protect Bond, Clearfil Tri-S Bond or One Up Bond F Plus) and distance from the light-curing tip (0, 3 or 6 mm). The bonded samples were tested in tension (0.5 mm/min) and nanoleakage was analyzed using SEM. Results. Clearfil Protect Bond exhibited the highest tensile strength on both enamel and dentin. Leakage was higher in samples exposed at a distance of 6 mm on enamel and 0 mm on dentin. One Up Bond F Plus experienced the greatest amount of nanoleakage on both substrates. Conclusions. Light-curing unit distance did not influence the μTBS of the adhesives, but nanoleakage increased on enamel samples when photoactivation occurred at a distance of 6 mm. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
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