Electron and Chemical Kinetics in the Low-Pressure RF Discharge Etching of Silicon in SF6.
| Autor: | Kline, L. E. |
|---|---|
| Zdroj: | IEEE Transactions on Plasma Science; 1986, Vol. 14 Issue 2, p145-155, 11p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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| Autor: | Kline, L. E. |
|---|---|
| Zdroj: | IEEE Transactions on Plasma Science; 1986, Vol. 14 Issue 2, p145-155, 11p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|