Time series modeling of reactive ion etching using neural networks.
| Autor: | Baker, M.D., Himmel, C.D., May, G.S. |
|---|---|
| Zdroj: | IEEE Transactions on Semiconductor Manufacturing; 1995, Vol. 8 Issue 1, p62-71, 10p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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| Autor: | Baker, M.D., Himmel, C.D., May, G.S. |
|---|---|
| Zdroj: | IEEE Transactions on Semiconductor Manufacturing; 1995, Vol. 8 Issue 1, p62-71, 10p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|