Measurement of Low-Energy X-Ray Dose Enhancement in MOS Devices with Metal Silicide Gates.
Autor: | Benedetto, J. M., Boesch, H. E., Oldham, T. R., Brown, G. A. |
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Zdroj: | IEEE Transactions on Nuclear Science; 1987, Vol. 34 Issue 6, p1540-1543, 4p |
Databáze: | Complementary Index |
Externí odkaz: |