Measurement of Low-Energy X-Ray Dose Enhancement in MOS Devices with Metal Silicide Gates.

Autor: Benedetto, J. M., Boesch, H. E., Oldham, T. R., Brown, G. A.
Zdroj: IEEE Transactions on Nuclear Science; 1987, Vol. 34 Issue 6, p1540-1543, 4p
Databáze: Complementary Index