Improvement of RF performance of GaAs/Si MESFETs using buried oxygen implantation.

Autor: Sriram, S., Messham, R.L., Smith, T.J., Eldridge, G.W.
Zdroj: IEEE Transactions on Electron Devices; 1996, Vol. 43 Issue 5, p834-836, 3p
Databáze: Complementary Index