Single-electron transistors based on Al/AlO/sub x//Al and Nb/AlO/sub x//Nb tunnel junctions.

Autor: Bluthner, K., Gotz, M., Hadicke, A., Krech, W., Wagner, T., Muhlig, H., Fuchs, H.-J., Hubner, U., Schelle, D., Kley, E.-B., Fritzsch, L.
Předmět:
Zdroj: IEEE Transactions on Applied Superconductivity; 1997, Vol. 7 Issue 2, p3099-3102, 4p
Abstrakt: As an alternative to the shadow evaporation method for the preparation of ultrasmall tunnel junctions we have established the so-called self-aligned in-line technique. It was applied to the fabrication of common Al/AlO/sub x//Al-type and, for the first time, Nb/AlO/sub x//Nb-based single-electron transistors. The characterization of the samples at temperatures in the range of a few hundred millikelvins reveals charging effects (Coulomb blockade and gate modulation) of the quasiparticle current. [ABSTRACT FROM PUBLISHER]
Databáze: Complementary Index